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|Title||Atom lithography is one of the latest proposals for high-resolution printing. The mask design and generation is key step for implementation of this method. In this paper, we …|
A new fully differential amplifier and a fully differential R-MOSFET-C fourth-order Chebyshev active lowpass filter employing passive resistors and current-steering MOS transistors as variable resistors are proposed. The implementation relies on the tunability of current-steering MOS transistors operating in the triode region which counteract the deviation of resistors in integrated circuit manufacturing...
|Published in||Microelectronics Journal|
|Series||Volume: 37, Number: 1|
|Item link||Item Link|
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