Please use this identifier to cite or link to this item:
http://hdl.handle.net/20.500.12358/26291
Title | Atom lithography is one of the latest proposals for high-resolution printing. The mask design and generation is key step for implementation of this method. In this paper, we … |
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Abstract |
A new fully differential amplifier and a fully differential R-MOSFET-C fourth-order Chebyshev active lowpass filter employing passive resistors and current-steering MOS transistors as variable resistors are proposed. The implementation relies on the tunability of current-steering MOS transistors operating in the triode region which counteract the deviation of resistors in integrated circuit manufacturing... |
Type | Journal Article |
Date | 2006 |
Published in | Microelectronics Journal |
Series | Volume: 37, Number: 1 |
Citation | |
Item link | Item Link |
License | ![]() |
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